01

Loading

Load the sample system into the coating chamber

02

Vacuum pumping

When depositing PVD coatings, high vacuum is required. Huasheng's coating system proceeds in two steps:

First, the mechanical pump reduces the vacuum chamber pressure from 1000mbar to 10-1mbar

Then, the turbo molecular pump generates a high vacuum of about 1X10-6mbar

03

Heating

Heat the chamber to around 500℃, which is the conventional process temperature

04

Plasma etching

Huasheng's coating system uses three different etching process technologies：

HUASHENG®（lateral glow discharge）

Argon plasma etching, glow discharge

Metal ion etching (Ti+ , Cr +)

05

Deposition

Coating deposition is achieved using PVD(arc ion plating, magnetron sputtering or integrated cathode HUASHENG®technology).

06

Cooling

Cool the coating chamber

07

Unloading

Unload the sample system from the coating chamber