Huasheng independently developed a new composite machine TC800 Plus, which combines the advantages of ion source,magnetron sputtering, and multi-arc ion plating technology to meet different film performance requirements.
Arc
|
Flexible automation |
Steady mass production |
Low temperature deposition <200°C |
Low costper piece |
|
Plasma etchingHigh-energy plasma effectively cleans product surfaces; Post-maintenance is convenient and flexible, High-energy plasma can efficient etching product surfaces. |
Transition layer deposition: Magnetron sputteringNon-balanced magnetic field design, high utilization rate of targets;Optional transition layer: Cr, WC, Ti..; High-quality coating, low coating stress. |
ta-C layer: AlP3 arc graphite target sources plus permanent magnet achieve high efficiency and uniform depositionta- coating with high hardness and high wear resistance. |
| Properties | TC800PLUS |
| Coating technology | Arc |
| Etching | WET |
| Arc sources | 3 |
| Cathode sources | 1 |
|
Equipment size(mm) |
Length4100*Width1850*Height2300 |
| Capacity (number of trees) | 10 |
| Rodcutter loading capacity(D4*50L) | 2400pcs |
| Max.service temperature(℃) | 200 |
| Maximum loading weight(KG) | 500 |
| Volume(m³) | 1 |
| Effective coating area(mm) | Φ650*400 |
| Spindle diameter(mm) | Φ130 |
| Process time(h) | 3~6 |
