HA500 Equipment introduction
The third generation composited coating technology
Length3750*Width1650*Height2700
|
Integrated Composite Plasma Source
|
High ionization rate
|
High deposition rate
|
No droplet
|
Composite multilayer film |
|
High precision technologyHigh energy pulsed plasma source with unique pulse modulation technology generates ms level pulsed plasma. |
High hardness coatingComposite multilayer film(nanocrystal/columnar crystal)
deposition, deposition of superlattice nanocrystal and superhard film. |
Excellent compatibility
Deposition of high melting point metals. |
| Properties | HA500 |
| Coating technology | The third generation composited coating technology |
| Etching |
The third generation lateral ion source (hot filament) |
|
Arc sources |
6 |
|
Magnetron Sputtering Source |
1 |
| Equipment size(mm) | Length3750*Width1650*Height2700 |
| Volume（m³） | 0.7 |
| Effective coating area (mm) | Φ410*400 |
| Maximum working temperature（℃） | 700 |
| Capacity (number of trees) | 5 |
| Insert load (APMT1135) | 6000pcs |
| End mill load (D4*50L) | 1800pcs |
| Maximum loading weight(KG) | 300 |
| Spindle diameter(mm) | Φ130 |
| Process time(h) | AITiN:6~8 |
